AUTHOR=Zhang Zhengang , Ye Baosheng , Qiu Zhijun , Zhang Huilin , Yu Chuanpeng TITLE=Does Technostress Increase R&D Employees' Knowledge Hiding in the Digital Era? JOURNAL=Frontiers in Psychology VOLUME=Volume 13 - 2022 YEAR=2022 URL=https://www.frontiersin.org/journals/psychology/articles/10.3389/fpsyg.2022.873846 DOI=10.3389/fpsyg.2022.873846 ISSN=1664-1078 ABSTRACT=

Technostress as an antecedent factor exploring knowledge hiding continues to be seldomly discussed in the digital era. Based on the job demand-resource theory, this article introduces work exhaustion as a mediator variable and constructs a model that the five sub-dimensions of technostress (i.e., overload, invasion, complexity, insecurity, and uncertainty) affect knowledge hiding for R&D employees. Similarly, this study analyzes the moderation of workplace friendship as the resource buffering effect. Based on data from the 254 questionnaires of the two-stage survey, empirical results show that: (1) Techno-invasion, techno-insecurity, and techno-complexity have significant positive effects on work exhaustion, and techno-invasion has the greatest effect. However, techno-overload and techno-uncertainty have no significant relationship with work exhaustion. (2) Work exhaustion plays a mediating role in the relationships between the three aspects of technostress (techno-invasion, techno-insecurity, techno-complexity) and knowledge hiding; However, its mediating effects are insignificant in the relationships between the two aspects of technostress (techno-overload and techno-uncertainty) and knowledge hiding. (3) Workplace friendship negatively moderates the relationships between the two aspects of technostress (techno-invasion and techno-insecurity) and work exhaustion, leading to less knowledge hiding. Nonetheless, its negative moderation for the relationships between the two aspects of technostress (techno-overload and techno-uncertainty) and work exhaustion are insignificant. Empirical results further show that workplace friendship positively moderates the relationship between techno-complexity and work exhaustion.