Optical technology based on extreme ultraviolet and X-ray source has unique advantages of high spatial resolution, elemental sensitivity, and large penetration depth. Based on the new generation of large photon source facilities, like synchrotron radiation facility and free-electron lasers, they have provided powerful observation tools for modern scientific researchers.
To build these advanced photon facilities and exert their maximum potential, the EUV and X-ray photons need to be tailored exquisitely in spatial, spectral, and time domains, with particular emphasis on the wavefront and coherence preservation at the same time. These requirements posed a huge challenge on the optics that are used to tailor and transport the photons in the beamlines. Reflective mirrors, diffraction gratings, zone plates, etc., need to be fabricated with nanometer to subnanometer figure accuracy and structure accuracy, to achieve the nanometers imaging resolution and milli-eV energy resolution. High efficiency of these optics is demanded with the help of high-quality coatings to transport the extreme brightness to the sample position. Metrology techniques with one order of magnitude higher precision than the previous level are required to assist the optics development and monitor the beam properties in the beamlines. All these optics need to be damage-resistant to the ultra-intense EUV and X-ray pulses. Tremendous progress on optics has been achieved in recent years while more is on the way.
High-quality Original Research and Review articles in the EUV and X-ray optics are all welcome for submission to this Research Topic. Research interests include but are not limited to the following areas:
1. High-precision Mirrors for deflecting, monochromatizing, collimating, etc.
2. Diffraction gratings for monochromator, spectrometer, and beam diagnostics
3. Focusing optics including KB, CRL, zone plates, and so on
4. Reflective coatings including single layer and multilayer
5. Metrology techniques for measuring surface figure of the optics and beam wavefront
6. Damage studies and improving methods for optics working under EUV and X-ray free-electron lasers
Optical technology based on extreme ultraviolet and X-ray source has unique advantages of high spatial resolution, elemental sensitivity, and large penetration depth. Based on the new generation of large photon source facilities, like synchrotron radiation facility and free-electron lasers, they have provided powerful observation tools for modern scientific researchers.
To build these advanced photon facilities and exert their maximum potential, the EUV and X-ray photons need to be tailored exquisitely in spatial, spectral, and time domains, with particular emphasis on the wavefront and coherence preservation at the same time. These requirements posed a huge challenge on the optics that are used to tailor and transport the photons in the beamlines. Reflective mirrors, diffraction gratings, zone plates, etc., need to be fabricated with nanometer to subnanometer figure accuracy and structure accuracy, to achieve the nanometers imaging resolution and milli-eV energy resolution. High efficiency of these optics is demanded with the help of high-quality coatings to transport the extreme brightness to the sample position. Metrology techniques with one order of magnitude higher precision than the previous level are required to assist the optics development and monitor the beam properties in the beamlines. All these optics need to be damage-resistant to the ultra-intense EUV and X-ray pulses. Tremendous progress on optics has been achieved in recent years while more is on the way.
High-quality Original Research and Review articles in the EUV and X-ray optics are all welcome for submission to this Research Topic. Research interests include but are not limited to the following areas:
1. High-precision Mirrors for deflecting, monochromatizing, collimating, etc.
2. Diffraction gratings for monochromator, spectrometer, and beam diagnostics
3. Focusing optics including KB, CRL, zone plates, and so on
4. Reflective coatings including single layer and multilayer
5. Metrology techniques for measuring surface figure of the optics and beam wavefront
6. Damage studies and improving methods for optics working under EUV and X-ray free-electron lasers
