Lithographic techniques in micro- and nanotechnology are a cornerstone in modern sensing and detection applications, providing precision structural control essential for the development of advanced surface-enhanced Raman scattering (SERS) substrates and photodetectors, wherein performance is sensitive to surface geometry. Lithography facilitates control over size, shape, and spacing of the metallic nanostructures used in SERS, thus optimizing SERS enhancements and ensuring consistent performance.

Significant advancements have been realized in maximizing electromagnetic field enhancements and improving sensitivity in detection processes through the creation of enhanced SERS hotspots. However, reproducibility across fabrication batches remains elusive, particularly as devices transition from research settings to industrial applications.

This Research Topic addresses these challenges by focusing on lithographically-enabled fabrication of reproducible and high-performance SERS substrates and photodetectors. Despite considerable progress in manipulating micro- and nanoscale architectures, reliable device performance is a persistent issue. We seek contributions that examine lithographic techniques for precise surface structuring, optimization of electromagnetic enhancement for SERS, and refinement of photodetector sensitivity through engineered micro- and nanostructures.

Papers exploring scalable, reliable, and cost-efficient lithographic strategies capable of producing uniform hotspots and improving optoelectronic characteristics are particularly welcomed. The ultimate goal is to facilitate the practical application of lithographically-fabricated devices in chemical, biological, and environmental monitoring, food safety, optical communication, and wearable technologies.

We will accept Original Research and Review articles. To obtain further insights in the fabrication and performance of these technologies, we welcome articles addressing, but not limited to, the following themes:

• Novel and scalable lithographic processes (e.g., nanoimprint lithography, photolithography, e-beam lithography, direct laser writing, multiphoton polymerization) for patterning microstructures (e.g., microlenses, micro-pillars, micro-gratings) and bottom-up nanofabrication (of, e.g., nanowires, nanopillars, quantum dots).
• Hybrid fabrication methods integrating lithography with self-assembly or synthesis.
• Micro- and nanostructured surfaces for enhanced SERS performance.
• Innovative designs to improve the efficacy of SERS substrates
• Development of photodetectors with high-aspect-ratio structures for superior absorption and carrier collection.

Are you interested in contributing a manuscript to this Research Topic?

Advanced Lithography Techniques for Reproducible SERS Substrates and Photodetectors in Micro and Nanotechnology Sensing