ORIGINAL RESEARCH article

Front. Nanotechnol.

Sec. Nanodevices

Volume 7 - 2025 | doi: 10.3389/fnano.2025.1621554

Performance and Variability Analysis of ALD-grown Wafer Scale HfO2/Ta2O5-based Memristive Devices for Neuromorphic Computing

Provisionally accepted
Dr. Sanjay  KumarDr. Sanjay Kumar1,2*Deepika  YadavDeepika Yadav1Spyros  StathopoulosSpyros Stathopoulos1Themis  ProdromakisThemis Prodromakis1*
  • 1University of Edinburgh, Edinburgh, United Kingdom
  • 2Indian Institute of Technology Dhanbad, Dhanbad, India

The final, formatted version of the article will be published soon.

Here, we report a large-scale wafer microfabrication process and in-depth electrical analysis of atomic layer deposition (ALD) grown bilayer (i.e., HfO2/Ta2O5) memristive devices. The fabricated bilayer devices initially require an electroforming event and show stable bipolar resistive switching responses with some variations in the device switching voltages. These variations are covered in the 15.7-22.7% range corresponding to the maximum switching voltage of the tested devices. Moreover, time series analysis (TSA) is employed by considering the device switching voltages (VSET and VRESET) to predict the device performance and the obtained outcomes are well matched to the experimental data. Furthermore, the least values of coefficient of variability (CV) in the device switching voltages are 6.09% (VSET) and 3.22% (VRESET) in the case of device-to-device (D2D) while 1.76% (VSET) and 2.14% (VRESET) in the case of cycle-to-cycle (C2C). Furthermore, the fabricated devices efficiently perform the synaptic functionalities in terms of potentiation (P) and depression (D), paired-pulse facilitation (PPF), and paired-pulse depression (PPD), with a least value of nonlinearity (NL) factor of 0.43 in synaptic response, which is close to the ideal value of NL in biological synapses. Therefore, the present work shows that the single ALD system can be an efficient deposition method to deposit high-k oxide materials for memristive arrays over large-scale wafers.

Keywords: Memristive Devices, Oxide materials, Performance matrix, Atomic layer deposition, Variability factor, device stability

Received: 02 May 2025; Accepted: 10 Jun 2025.

Copyright: © 2025 Kumar, Yadav, Stathopoulos and Prodromakis. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) or licensor are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.

* Correspondence:
Dr. Sanjay Kumar, University of Edinburgh, Edinburgh, United Kingdom
Themis Prodromakis, University of Edinburgh, Edinburgh, United Kingdom

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