ORIGINAL RESEARCH article
Front. Mech. Eng.
Sec. Mechatronics
Design of Constant Force Polishing Device for Castings Based on Kinematic Analysis
Provisionally accepted
- Zibo Vocational Institute, Zibo, China
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In response to the problem of insufficient stability in force control of existing polishing equipment, this study aims to develop a casting constant force polishing device based on kinematic analysis to meet the high-precision and high-efficiency requirements of surface machining of large castings. Starting from the casting processing technology, combined with mechanical principles and optimization design methods, the overall structural design and optimization of the polishing device are completed. At the same time, a kinematic model is established and a control system based on programmable logic controller is constructed. The results of motion simulation and adaptability verification show that the polishing device exhibits good adaptability and stability under different surface characteristics of castings, and the trajectory accuracy can reach up to 90%. The average polishing force can quickly stabilize under different characteristics, and the average polishing force of planar features remains stable between 490N and 500N with minimal fluctuations. The improved proportional-integral-derivative control strategy significantly improves control accuracy and response speed, with a minimum root mean square error value of 0.08 and an error recovery time of only 4.0 seconds. The research designed constant force polishing device for castings not only improves the surface machining quality of castings, but also provides an efficient and stable solution for automated polishing of large castings, which has important industrial application value.
Keywords: Constant force polishing device for castings, kinematics, PID, PLC control system, structural optimization
Received: 22 Sep 2025; Accepted: 08 Dec 2025.
Copyright: © 2025 Zhao. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) or licensor are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.
* Correspondence: Feifei Zhao
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