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Editorial: Nanofilms and Nanostructures for Energy Applications
Editorial13 January 2021
Editorial: Nanofilms and Nanostructures for Energy Applications

Since the beginning of the nanotechnology era, many efforts have been made to fully understand and explore the potential of nanoscale science and technology. In the last decades, we witness how advances in this multidisciplinary field are increasingly present in our daily lives. Among its areas of application, the use of nanomaterials to improve the performance of energy conversion, harvesting, and storage devices is one of the hot topics. The outstanding properties of different types of nanomaterials provide a wide opportunity for researchers and designers to develop more efficient energy technologies. Currently, nanomaterials are explored in several energy devices, such as solar cells, fuel cells, supercapacitors, batteries, among others. In this context, a significant progress in the synthesis, characterization and processing of nanomaterials for energy applications is being achieved. This research topic collected five articles, three original research articles, one methods article and one review article, which cover recent findings and developments in nanofilms and nanostructures for energy applications. Relevant themes in nanotechnology for energy research field were explored in these publications, namely electrodeposited Ni-Cu foams as electrodes for supercapacitors, optical properties of plasmonic nanostructures, growth of titanium dioxide (TiO2) thin films by atomic layer deposition (ALD), fabrication of high-efficiency hydrogenated amorphous-silicon (a-Si:H) solar cells and preparation of supported metal catalysts using non-thermal plasmas. Figure 1 illustrates these themes.The first original research article reports the results of the electrochemical characterization of electrodeposited porous nickel-copper metallic foams on stainless steel substrate by the dynamic hydrogen bubbling template technique aiming at its use as an electrode for supercapacitors. The effect of working parameters, such as the applied current density and deposition time, on the surface morphology and properties of the electrodeposited layers were also discussed. It was observed that the Ni-Cu foams have the potential to be used as an ideal electrode material for supercapacitors (Abdelfatah et al.). This is a provisional file, not the final typeset articleThe second original research article presents a theoretical investigation on the optical properties of metallic nanostructures and how they support plasmon resonances that can be tuned in the desired range of the solar spectrum by changing their size, shape, and surrounding environment. This study focused on two different systems: isolated and coupled gold metal nanospheres. The results indicated that the simulation of extinction spectrum of these nanostructures can be further extended to coupled nanospheroids, coupled nanorods, and chains of nanoparticles, which can be used in several applications such as solar stills, solar collectors, and solar cells (Pathak). . ALD technique provides a unique tool to grow thin films with excellent conformity and thickness control down to atomic levels, which has motivated its use in solar cells research. Besides its application in well-established solar cell concepts such as c-Si and CIGS (copper indium gallium selenide), ALD technique has also been used to produce nanostructured thin films for emerging solar cell concepts such as dye-sensitized solar cells (DSSC) and perovskite-based solar cells. Among the most studied ALD films for such applications, the TiO2 has been highlighted.The methods article proposes a promising shadow masking technique to fabricate high-efficiency a-Si:H using plasma enhanced chemical vapor deposition (PECVD). The solar cell fabrication process based on this technique was described in detail. The influence of the different masking methods on the cell parameters was also discussed. The results show that the use of proposed shadow masking technique using p-i-n structure deposited on large-area substrates, followed by the deposition of back contact through a metal mask, and by ultrasonic welding of indium is a good alternative to laser scribing in the laboratory scale (Alaoui et al.).The review article discusses on the use of non-thermal plasmas in the preparation or pretreatment of supported metal catalysts for fuel conversion in automotive systems. Several studies show that the use of non-plasma technology can be an advantageous process in supported metal catalysts due to the dispersion of metallic nanoparticles present in the catalyst surface, causing stronger interaction between active phase and support. Thus, higher activity, selectivity, and stability, as well as lower activation temperature, are observed. This review provides the reader with an overview showing the synergistic effects between plasma environment and heterogeneous catalysis, the methods of preparation of supported metal catalysts, detailing several plasma-assisted processes, and presenting the main results of plasma-prepared supported metal catalysts for fuel conversion. (dos Santos et al.).Overall, the articles published in this research topic report and discuss various important and current issues related to nanomaterials for energy applications. Different materials, techniques and applications were addressed making this collection of articles a good reference to researchers working on these subjects.

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An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique
In this paper, theoretical and experimental approaches were used to evaluate the impact of the precursor’s pulse time on the growth per cycle (GPC) and on the crystallinity quality of atomic layer deposited TiO2 thin films on Si(100) and FTO substrates. In theoretical investigation, we employ a general model that can be applied to both metal and oxidant precursors, and it is based on the Maxwell-Boltzmann velocity distribution from which the molecular flux of gases that collide with the substrate is deduced to adjust the experimental characteristics of GPC versus pulse time. This model allowed us to adjust the GPC of TiO2 films produced by thermal atomic layer deposition and by plasma-enhanced atomic layer deposition under different deposition parameters and substrates. In experimental investigation, the influence of GPC on the chemical and structural properties of TiO2 thin films was evaluated by Rutherford backscattering spectroscopy, grazing incidence x-ray diffraction and ellipsometry techniques. In thermal mode, using H2O as an oxidant precursor, the stoichiometry of TiOx films has an x value of 1.98 from the GPC saturated regardless of the metal precursor or substrate used. In addition, using O2 plasma, a super-stoichiometric film with x values from 2.02 to 2.30 is obtained. In thermal mode, the GPC saturated and film thickness are, on average, 40% higher for TiCl4 compared to TTIP precursor. Using O2 plasma, the growth per cycle saturated is approximately twice as high the thermal mode using TTIP precursor. For both atomic layer deposition modes, the crystallinity degree showed values of 50% to 80% for TiCl4 in the temperature range of 250 to 350 ºC. On the other hand, for TTIP, it was below 40% in thermal mode and between 80 and 95% in plasma mode (250 ºC). It was observed that the reaction rate, the diffusion coefficient and the molecular flux are inversely proportional to the temperature. These results evidenced that the crystallinity and epitaxial quality of the TiO2 film are higher for TTIP using O2 plasma. However, a better stability of the parameters analyzed for TiCl4 in the two atomic layer deposition modes was verified.

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23 citations

METHODS
23 November 2020
Promising Shadow Masking Technique for the Deposition of High-Efficiency Amorphous Silicon Solar Cells Using Plasma-Enhanced Chemical Vapor Deposition
Kawtar Belrhiti Alaoui, 2 more and Abdelkader Outzourhit

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7 citations

Electrochemical Characterization of Electrodeposited Ni–Cu Foams and Their Application as Electrodes for Supercapacitors
ORIGINAL RESEARCH
26 June 2020
Electrochemical Characterization of Electrodeposited Ni–Cu Foams and Their Application as Electrodes for Supercapacitors
Aliaa Abdelfatah, 3 more and Khaled M. Zohdy
Nanoporous nickel–copper metallic foams were electordeposited using hydrogen templating (DHBT) technique. The effect of deposition parameters (applied current density and deposition time) on surface morphology of the obtained layers was studied with the aid of SEM. The Ni–Cu electrodeposited layers were characterized by a porous dendritic structure. According to EDX analysis, increasing both the deposition time and applied current density leads to an increase of the Ni content in the nano-foams. These foams were tested as electrodes for supercapacitors in 1 M KOH solutions. From potentiodynamic polarization test, the corrosion rate was accelerated with increasing the deposition time up to 150 s as well as the deposition current density up to 1.8 A/cm2. The electrochemical behavior of the material was studied by cyclic voltammetry aiming at its application as positive electrodes for supercapacitors, using 1 M KOH solution. From cyclic voltammetry, toth the increase of applied current density and the deposition time lead to an increase of the current density and total charge measured by cyclic voltammetry, having a beneficial effect on the electrochemical activity of the Ni-Cu films. The highest forward current peak was obtained for nickel–copper foams deposited at 2 Acm-2 for 150 s. From EIS test, the polarization resistance (Rp) decreased with increasing the current density as well as electrodeposition time. The lowest polarization resistance was recorded for porous Ni-Cu layers electrodeposited at 2 A/cm2 for 150 sec, indicating high electrochemical activity of this layers (35.02%Cu) as electrodes for supercapacitors.

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15 citations