ORIGINAL RESEARCH article

Front. Plant Sci.

Sec. Crop and Product Physiology

Volume 16 - 2025 | doi: 10.3389/fpls.2025.1634174

This article is part of the Research TopicElucidating the Molecular, Physiological, and Biochemical Mechanisms Underlying Stress Responses in Crop PlantsView all 17 articles

One-Time Double-Layer Placement of Controlled-Release Urea Enhances Wheat Yield, Nitrogen Use Efficiency and Mitigates N2O Emissions

Provisionally accepted
Muhammad  AkhtarMuhammad Akhtar1Liuge  WuLiuge Wu1Chen  JianChen Jian1Su  YuxiaoSu Yuxiao2Zheng  YuntanZheng Yuntan2Lu  YulunLu Yulun2Zheng  ShanchaoZheng Shanchao2Deng  AixingDeng Aixing1Zhenwei  SongZhenwei Song1Zheng  ChengyanZheng Chengyan1*Zhang  WeijianZhang Weijian1*
  • 1Institute of Crop Sciences, Chinese Academy of Agricultural Sciences/Key Laboratory of Crop Physiology and Ecology, Ministry of Agriculture and Rural Affairs of China, Beijing 100081, China
  • 2Dongping County Agricultural Bureau, Dongping County, 271500, China

The final, formatted version of the article will be published soon.

Simultaneously enhancing the crop yield and reducing nitrous oxide (N2O) emissions presents a critical challenge in sustainable agriculture. The application of nitrogen (N) fertilizer is a key strategy to enhance crop yield. However, conventional N application practices often lead to excessive soil N accumulation, insufficient crop N uptake and elevated greenhouse gas (GHG) emissions. To address these issues, this study evaluated the effectiveness of one-time double-layer fertilization of controlled-release urea (CRU) in improving wheat yield, nitrogen use efficiency (NUE) and mitigating N2O emissions compared to single-layer fertilization. A two-year field experiment (2021-2023) was conducted with five treatments: zero N fertilizer (T0), one-time single-layer fertilization of urea at 8-10 cm soil depth (T1), one-time single-layer fertilization of CRU at 8-10 cm soil depth (T2), one-time double-layer fertilization of urea at 8-10 cm & 18-20 cm soil depth (T3), one-time double-layer fertilization of CRU at 8-10 cm & 18-20 cm soil depth (T4). The two-year average results indicated that one-time double-layer fertilization of CRU (T4) achieved the highest wheat yield (10.20 t ha -1 ) and NUE (19.13 kg kg -1 ), as well as the lowest N2O emissions (0.66 kg ha -1 ). Compared to single-layer CRU fertilization (T2), T4 increased wheat yield and NUE by 5.94% and 11.26%, respectively, while reducing N2O emissions by 22.50%. Furthermore, T4 optimized the soil microenvironment by lowering soil temperature and NO3 --N content at 0-10 cm depth, while enhancing soil moisture and NH4 + -N availability at 10-20 cm, thereby promoting plant N uptake and utilization. These findings suggest that the one-time doublelayer fertilization of CRU synchronizes N release with crop demand and regulates soil N dynamics, offering a promising strategy to boost wheat productivity and minimize environmental impacts.

Keywords: Layered fertilization, Controlled-release urea, nitrogen use efficiency, wheat yield, N2O emissions

Received: 23 May 2025; Accepted: 14 Jul 2025.

Copyright: © 2025 Akhtar, Wu, Jian, Yuxiao, Yuntan, Yulun, Shanchao, Aixing, Song, Chengyan and Weijian. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) or licensor are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.

* Correspondence:
Zheng Chengyan, Institute of Crop Sciences, Chinese Academy of Agricultural Sciences/Key Laboratory of Crop Physiology and Ecology, Ministry of Agriculture and Rural Affairs of China, Beijing 100081, China
Zhang Weijian, Institute of Crop Sciences, Chinese Academy of Agricultural Sciences/Key Laboratory of Crop Physiology and Ecology, Ministry of Agriculture and Rural Affairs of China, Beijing 100081, China

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